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| LEADER |
01024cam a2200289 7i4500 |
| 001 |
0000030970 |
| 005 |
20170218090000.0 |
| 008 |
091125 eng |
| 020 |
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|a 0071445633 (hbk.)
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| 020 |
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|a 9780071445634 (hbk.)
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| 040 |
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|a DLC
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| 090 |
0 |
0 |
|a TK7872.M3
|b E96 2005
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| 100 |
1 |
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|a Eynon, Benjamin G
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| 245 |
1 |
0 |
|a Photomask fabrication technology
|c Benjamin G. Eynon, Jr., Banqiu Wu.
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| 260 |
|
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|a New York:
|b McGraw-Hill,
|c 2005.
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| 300 |
|
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|a xi, 571 p.:
|b ill.;
|c 24 cm.
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| 490 |
0 |
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|a McGraw-Hill electronic engineering
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| 504 |
|
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|a Includes bibliographical references and index
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| 650 |
0 |
0 |
|a Integrated circuits --
|x Masks
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| 650 |
0 |
0 |
|a Microlithography
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| 650 |
0 |
0 |
|a Masks (Electronics)
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| 700 |
3 |
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|a Banqiu, Wu
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| 997 |
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|a Engineering, Faculty
|b Engineering, Department
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| 998 |
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|a Electrical & Electronic Engineering, Diploma
|
| 998 |
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|a Electrical Engineering, Degree
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| 998 |
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|a Electronics Engineering, Degree
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| 999 |
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|a 0000037858
|b BOK
|c OPEN SHELF
|e 1st Floor, Bestari Jaya
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