Photomask fabrication technology
| Main Author: | Eynon, Benjamin G |
|---|---|
| Other Authors: | Banqiu, Wu |
| Language: | English |
| Published: |
New York:
McGraw-Hill,
2005.
|
| Series: |
McGraw-Hill electronic engineering
|
| Subjects: |
| Physical Description: |
xi, 571 p.: ill.; 24 cm. |
|---|---|
| Bibliography: |
Includes bibliographical references and index |
| ISBN: |
0071445633 (hbk.) 9780071445634 (hbk.) |